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个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:清华大学
学位:博士
所在单位:控制科学与工程学院
学科:微电子学与固体电子学. 凝聚态物理. 控制理论与控制工程
电子邮箱:dwang121@dlut.edu.cn
Barrier inhomogeneities and interface states of metal/4H-SiC Schottky contacts
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论文类型:期刊论文
发表时间:2016-12-01
发表刊物:JAPANESE JOURNAL OF APPLIED PHYSICS
收录刊物:SCIE、Scopus
卷号:55
期号:12
ISSN号:0021-4922
摘要:The barrier and interface states of Ti, Mo, Ni, and Pt contacts to 4H-SiC were investigated. It is found that the barrier heights for all the contacts are Gaussianly distributed and the barrier inhomogeneity varies with the contact metal type. However, the energy-averaged interface states density in the band gap is metal-insensitive. When considering Gaussian distribution, the interface states density extracted from the electrical properties is consistent with the average density of Gaussianly distributed 4H-SiC surface states, indicating that the barrier inhomogeneities at metal/SiC contacts mainly originate from the spatial variation of surface states on SiC surface. The barrier height and barrier inhomogeneity could be modulated by the contact metal, obeying the barrier height theory of Cowley and Sze. (C) 2016 The Japan Society of Applied Physics