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Experimental investigations of electron density and ion energy distributions in dual-frequency capacitively coupled plasmas for Ar/CF4 and Ar/O2/CF4 discharges

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Indexed by:期刊论文

Date of Publication:2014-01-01

Journal:J. Appl. Phys.

Volume:115

Issue:1

Page Number:13301-13301

Pre One:Experimental and Numerical Studies of Pulse-Modulated ICP Discharges

Next One:Mode transition in CF4 + Ar inductively coupled plasma
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