邹赫麟

个人信息Personal Information

教授

博士生导师

硕士生导师

性别:男

毕业院校:威尔大学

学位:博士

所在单位:机械工程学院

学科:微机电工程

办公地点:机械工程学院2号楼214-2

联系方式:办公电话:0411-84709754

电子邮箱:zouhl@dlut.edu.cn

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Effect of La doping on crystalline orientation, microstructure and dielectric properties of PZT thin films

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论文类型:期刊论文

发表时间:2017-10-01

发表刊物:MATERIALS TESTING

收录刊物:SCIE

卷号:59

期号:10

页面范围:885-889

ISSN号:0025-5300

关键字:PLZT thin films; preferred orientation; columnar microstructure; dielectric properties; La doping concentration

摘要:Lanthanum (La)-modified lead zirconate titanate (PLZT) thin films with doping concentration from 0 to 5 at.-% have been fabricated by sol-gel methods to investigate the effects of La doping on crystalline orientation, microstructure and dielectric properties of the modified films. The characterization of PLZT thin films were performed by X-ray diffractometry (XRD), scanning electron microscopy (SEM) and precision impedance analysis. XRD analysis showed that PLZT films with La doping concentration below 4 at.-% exhibited (100) preferred orientation. SEM results indicated that PLZT films presented dense and columnar microstructures when La doping concentration was less than 3 at.-%, while the others showed columnar microstructures only at the bottom of the cross section. The maximum dielectric constant (1502.59 at 100 Hz) was obtained in a 2 at.-% La-doped film, which increased by 53.9 % compared with undoped film. Without introducing a seed layer, (100) oriented PLZT thin films were prepared by using conventional heat treatment process and adjusting La doping concentration.