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论文类型：期刊论文

发表时间：2016-09-01

发表刊物：JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

收录刊物：SCIE、EI、Scopus

卷号：16

期号：9

页面范围：9751-9755

ISSN号：1533-4880

关键字：Optical Lithography; Low Cost Photomask Fabrication; AZ703 Photoresist

摘要：To pattern micro-or nanostructures by optical lithography, the expensive photomask must be used. In the present work, a novel photomask fabrication technique based on UV photolithography and inclined Cu deposition was developed. By this technique low-cost photomask with 330 nm line width can be fabricated in only two steps. To fabricate photomasks with different size, the influence of the height of the photoresist on the line width of the photomask was investigate, and the effect of the O-2 plasma parameters on the water contact angle of exposed SU-8 was analyzed. With this newly developed technology, low-cost and simple photomasks can be fabricated, which allows a commercially manufacturing of micro or nano-components with low cost.