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Date of Publication:2022-10-02
Journal:JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING TRANSACTIONS OF THE ASME
Volume:128
Issue:1
Page Number:175-179
ISSN No.:1087-1357
Pre One:EFFECT OF NITROGEN-DOPED CONCENTRATION ON THE TCR OF ITO THIN FILMS AT HIGH TEMPERATURE
Next One:Investigation of temperature-dependent ferroelectric Properties of Y-doped HfO2 thin film prepared by middle-frequency reactive magnetron co-sputtering
