Hits:
Date of Publication:2022-10-03
Journal:PHYSICS OF PLASMAS
Volume:23
Issue:8
ISSN No.:1070-664X
Pre One:Influence of N-2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering
Next One:Hydrogen plasma induced crystallization of Si thin films by remote inductively coupled plasma source assistant pulsed dc twin magnetron sputtering
