location： Current position: Home >> Scientific Research >> Paper Publications

射频反应磁控溅射法在高速钢基底上制备SiO_2薄膜(英文)

Hits:

Indexed by:会议论文

Date of Publication:2022-06-30

Journal:第八届真空冶金与表面工程学术会议

Page Number:8

Note:新增回溯数据

Pre One:射频反应磁控溅射法在高速钢基底上制备SiO_2薄膜

Next One:微波ECR全方位离子注入制备类金刚石碳膜的结构及摩擦学性能研究
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep