location: Current position: Home >> Scientific Research >> Paper Publications

射频反应磁控溅射法在高速钢基底上制备SiO_2薄膜

Hits:

Indexed by:会议论文

Date of Publication:2022-06-30

Journal:第八届全国真空冶金与表面工程学术会议

Page Number:1

Note:新增回溯数据

Pre One:射频反应磁控溅射制备AlN多晶薄膜及其择优取向研究

Next One:射频反应磁控溅射法在高速钢基底上制备SiO_2薄膜(英文)