Current position: Home >> Scientific Research >> Paper Publications

射频反应磁控溅射法在高速钢基底上制备SiO_2薄膜

Release Time:2024-10-17  Hits:

Indexed by: Conference Paper

Date of Publication: 2022-06-30

Journal: 第八届全国真空冶金与表面工程学术会议

Page Number: 1

Note: 新增回溯数据

Prev One:射频反应磁控溅射制备AlN多晶薄膜及其择优取向研究

Next One:射频反应磁控溅射法在高速钢基底上制备SiO_2薄膜(英文)
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Mobile phone sweep