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Indexed by:期刊论文

Date of Publication:2012-03-15

Journal:SURFACE & COATINGS TECHNOLOGY

Included Journals:SCIE、EI

Volume:206

Issue:14

Page Number:3159-3164

ISSN No.:0257-8972

Key Words:Micro-crystalline silicon; Magnetron sputtering; Inductively coupled plasma; Langmuir probe; Optical emission spectrum

Abstract:Hydrogenated microcrystalline silicon thin films (mu c-Si:H) were deposited by remote inductively coupled plasma assistant pulsed dc twin magnetron sputtering at temperatures below 300 degrees C. The formation of mu c-Si:H was only found in the environment of hydrogen plasma, where Ar and H-2 mixed gas was used. In pure argon plasma or without the assistance of ICP in the Ar/H-2 gas mixtures, all the samples were amorphous structure. It suggested that ICP hydrogen plasma which enhanced the density and energy of H radicals played the key role in the formation of mu c-Si:H films. (C) 2011 Elsevier B.V. All rights reserved.