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Reduction of internal stress in SU-8 photoresist layer by ultrasonic treatment

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Indexed by:Journal Papers

Date of Publication:2010-11-09

Journal:SCIENCE CHINA - TECHNOLOGICAL SCIENCES

Included Journals:SCI、EI

Volume:55

Issue:11

Page Number:3006-3013

Note:JCR二区，IF：1.441（2015）

Pre One:Experimental study on ultrasonic stress relief for cured SU-8 photoresist layer

Next One:Quantitative Investigation of the Adhesion Strength Between an SU-8 Photoresist and a Metal Substrate by Scratch Tests
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