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Paper Publications

[101]Zhang, Yu, Xu, Jun, Zhou, Da-Yu, Wang, Hang-Hang, Lu, Wen-Qi, Choi, Chi-Kyu, J (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of...[J],CERAMICS INTERNATIONAL,2018,44(11):12841-12846
[102]Zhang, Yu, Xu, Jun, Zhou, Da-Yu, Wang, Hang-Hang, Lu, Wen-Qi, Choi, Chi-Kyu, J (reprint author), Dalian Univ Technol, Minist Educ, Sch Phys, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO2 films[J],CHINESE PHYSICS B,2018,27(4)
[103]Sun, Nana, Xu, Jin, Zhou, Dayu, Zhao, Peng, Li, Shuaidong, Wang, Jingjing, Chu, Shichao, Ali, Faizan, DY (reprint author), Dalian Univ Technol, Sch Mat Sci & Engn, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..DC reactively sputtered TiNx thin films for capacitor electrodes[J],JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2018,29(12):10170-10176
[104]Vopson, M. M., Zhou, D., Caruntu, G., MM (reprint author), Univ Portsmouth, Fac Sci, Portsmouth PO1 3QL, Hants, England..Multicaloric effect in bi-layer multiferroic composites[J],APPLIED PHYSICS LETTERS,2015,107(18)
[105]Liang, Hailong, Xu, Jin, Zhou, Dayu, Sun, Xu, Chu, Shichao, Bai, Yizhen, DY (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Thickness dependent microstructural and electrical properties of TiN thin films prepared by DC ...[J],CERAMICS INTERNATIONAL,2016,42(2):2642-2647
[106]杨喜锐, 周大雨, 马晓倩, 王雪霞, 徐进, 陈国清, 侯晓多, 刘晓英, 高晓霞.Synthesis of dopant-free tetragonal zirconia nano-powders with aqueous precursor and their optica...[J],Materials Research Expresss,2018,6:15041-15041
[107]Knebel, Steve, Mikolajick, Thomas, Heitmann, Johannes, Agaiby, Rimoon, Pesic, Milan, Slesazeck, Stefan, Schroeder, Uwe, Zhou, Dayu, U (reprint author), Namlab gGmbH, D-01187 Dresden, Germany..Reliability Comparison of ZrO2-Based DRAM High-k Dielectrics Under DC and AC Stress[J],IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY,2017,17(2):324-330
[108]Zhang, Yu, Xu, Jun, Wang, You-Nian, Choi, Chi Kyu, Zhou, Da-Yu, J (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China..Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and ele...[J],JOURNAL OF THE KOREAN PHYSICAL SOCIETY,2016,68(5):679-685
[109]Knebel, Steve, Schroeder, Uwe, Zhou, Dayu, Mikolajick, Thomas, Krautheim, Gunter, S (reprint author), Nanoelect Mat Lab gGmbH, D-01187 Dresden, Germany..Conduction Mechanisms and Breakdown Characteristics of Al2O3-Doped ZrO2 High-k Dielectrics for ...[J],IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY,2014,14(1):154-160
[110]周大雨, 徐进, Johannes M, Uwe Schr?der, Zhou, DY (reprint author), Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China..Si掺杂HfO_2薄膜的铁电和反铁电性质[J],物理学报,2014,63(11):294-298

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