Release Time:2022-10-09 Hits:
Date of Publication: 2022-10-09
Journal: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Institution: 机械工程学院
Volume: 63
Page Number: 97-106
ISSN: 1369-8001
Prev One:Surface integrity and removal mechanism of chemical mechanical grinding of silicon wafers using a newly developed wheel
Next One:Surface layer damage of quartz glass induced by ultra-precision grinding with different grit size