Environment-friendly chemical mechanical polishing using NaHCO3-activated H2O2 slurry for highly efficient finishing of 4H-SiC (0001) surface
Release Time:2024-04-28 Hits:
Date of Publication: 2024-04-27
Journal: Journal of Manufacturing Processes
Volume: 109
Page Number: 213-221
ISSN: 1526-6125