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单晶碳化硅电化学机械抛光液的组分设计与优化

Release Time:2024-12-05  Hits:

Indexed by: Journal Papers

Document Code: 413441

Date of Publication: 2024-10-20

Journal: 金刚石与磨料磨具工程

Volume: 44

Issue: 5

Page Number: 675-684

ISSN: 1006-852X

Key Words: 单晶碳化硅; 抛光液成分; 材料去除率; 电化学氧化; 表面粗糙度

CN: 41-1243/TG

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