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单晶碳化硅电化学机械抛光液的组分设计与优化

Release Time:2024-12-05 Hits:

Date of Publication: 2024-12-05

Journal: 金刚石与磨料磨具工程

Volume: 44

Issue: 05

Page Number: 675-684

ISSN: 1006-852X

Key Words: electrochemical oxidation; material removal rate; polishing slurry compositions; single crystal SiC; surface roughness

CN: 41-1243/TG

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