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[单晶碳化硅电化学机械抛光液的组分设计与优化]

Release Time:2024-12-05  Hits:

Indexed by: Journal Papers

Document Code: 413441

Date of Publication: 2024-10-31

Journal: Jingangshi yu Moliao Moju Gongcheng/Diamond and Abrasives Engineering

Volume: 44

Issue: 5

Page Number: 675 - 684

ISSN: 1006-852X

Key Words: electrochemical oxidation; material removal rate; polishing slurry compositions; single crystal SiC; surface roughness

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