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Quantitative study of oxidation mechanism in photoelectrochemical mechanical polishing of difficult-to-process semiconductor wafers

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Date of Publication:2025-10-25

Journal:INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

Volume:210

ISSN No.:0890-6955

Key Words:ANATASE; GALLIUM NITRIDE; N-TYPE GAN; RUTILE; SINGLE-CRYSTAL

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