Quantitative study of oxidation mechanism in photoelectrochemical mechanical polishing of difficult-to-process semiconductor wafers
Release Time:2025-10-26 Hits:
Indexed by: Journal Papers
Document Code: 565866
Date of Publication: 2025-08-04
Journal: INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
Volume: 210
ISSN: 0890-6955
Key Words: ANATASE; GALLIUM NITRIDE; N-TYPE GAN; RUTILE; SINGLE-CRYSTAL