点击次数：

论文类型：期刊论文

发表时间：2015-03-01

发表刊物：JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

收录刊物：Scopus、EI、SCIE

卷号：33

期号：2

ISSN号：0734-2101

摘要：In traditional capacitively coupled plasmas, the discharge can be described by an electrostatic model, in which the Poisson equation is employed to determine the electrostatic electric field. However, current plasma reactors are much larger and driven at a much higher frequency. If the excitation wavelength lambda in the plasma becomes comparable to the electrode radius, and the plasma skin depth delta becomes comparable to the electrode spacing, the electromagnetic (EM) effects will become significant and compromise the plasma uniformity. In this regime, capacitive discharges have to be described by an EM model, i.e., the full set of Maxwell's equations should be solved to address the EM effects. This paper gives an overview of the theory, simulation and experiments that have recently been carried out to understand these effects, which cause major uniformity problems in plasma processing for microelectronics and flat panel display industries. Furthermore, some methods for improving the plasma uniformity are also described and compared. (C) 2015 American Vacuum Society.