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Experimental investigations of electron density and ion energy distributions in dual-frequency capacitively coupled plasmas for Ar/CF4 and Ar/O2/CF4 discharges

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Indexed by:期刊论文

Date of Publication:2015-01-01

Journal:J. Appl. Phys.

Volume:117

Issue:14

Page Number:143301-143301

Pre One:Characterization of O2/Ar inductively coupled plasma studied by using a Langmuir probe and global model

Next One:Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias
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