Release Time:2019-03-12 Hits:
Indexed by: Journal Article
Date of Publication: 2015-01-01
Journal: J. Appl. Phys.
Volume: 117
Issue: 14
Page Number: 143301-143301
Prev One:Characterization of O2/Ar inductively coupled plasma studied by using a Langmuir probe and global model
Next One:Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias