Influence of Ar/H2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition
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论文类型：期刊论文
发表时间：2012-01-01
发表刊物：thin solid film
卷号：521
期号：10
页面范围：181-184
