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Associate Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates

Paper Publications

[41]piaoyong, XU Jun, gaopeng, 丁万昱, Wenqi Lu, matengcai.碳含量对碳氮化硅薄膜化学结构和力学性能的影响[J],真空科学与技术学报,2022,6:526-529
[42]丁万昱, XU Jun, 李艳琴, gaopeng, piaoyong, dengxinlv, dongchuang.等离子体中Si原子相对密度对SiNx薄膜结构、性能的影响[A],TFC'05全国薄膜技术学术研讨会,2022,1
[43]孙文立, XU Jun, Wenqi Lu.等离子体增强磁控溅射沉积碳化硅薄膜的化学结构与成膜机理[J],物理化学学报,2022,26(8):2311-2316
[44]XU Jun, Wenqi Lu.等离子体技术沉积SiCN薄膜中O杂质的来源、化合状态及其对薄膜结构和性能的影响[J],真空科学与技术,2022,29(1):26-30
[45]赵艳艳, XU Jun, 丁万昱, 张明明, Wenqi Lu.等离子体技术沉积SiCN薄膜中杂质O的来源、化合状态及其对薄膜结构和性能的影响[J],真空科学与技术学报,2022,1:26-30
[46]丁万昱, gaopeng, dengxinlv, dongchuang, XU Jun.类金刚石磁盘保护膜的性能、应用与制备[J],真空科学与技术学报,2022,1:41-46,49
[47]王金雪, guoxinwen, XU Jun, Wenqi Lu.等离子体溅射沉积法制备Ag/TS-1催化剂及其丙烯气相环氧化性能研究[A],第十三届全国催化学术会议,2022,1
[48]马国佳, 吴志猛, 李新, dengxinlv, XU Jun, TANG.等离子体源离子注入法制备类金刚石薄膜[J],材料保护,2022,36(5):48-50
[49]zhuming, 苏元军, 范鹏辉, XU Jun.等离子体源辅助磁控溅射法低温(200℃)制备多晶硅薄膜[J],真空,2022,3:47-50
[50]Qiu, Wei, Kang, Yi-Lan, Cheng, Cui-Li, Liang, Ren-Rong, Zhao, Chun-Wang, Lei Zhenkun, Yu-Cheng, Ma, Lu-Lu, XU Jun, Fang, Hua-Jun.Measurement of residual stress in a multi-layer semiconductor heterostructure by micro-Raman sp...[J],Acta Mechanica Sinica,2022,32(5):805-812

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