Current position: Home >> Scientific Research >> Paper Publications

Insights into the role of electrolytes in slurry performance for photoelectrochemical mechanical polishing of GaN wafers

Release Time:2026-03-29  Hits:

Indexed by: Journal Papers

Document Code: 474843

Date of Publication: 2025-01-01

Journal: JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T

Volume: 36

Page Number: 2096-2104

ISSN: 2238-7854

Key Words: GALLIUM NITRIDE

Prev One:Dispersal mechanism of different dispersants and its effect on performance of 4H-SiC polishing slurry

Next One:Electric-field-modulated oxidation and its effect on photoelectrochemical mechanical polishing of 4H-SiC