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Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

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Indexed by:期刊论文

Date of Publication:2012-02-08

Journal:18th International Vacuum Congress (IVC)/International Conference on Nanoscience and Technology (ICNT)/14th International Conference on Surfaces Science (ICSS)/Vacuum and Surface Sciences Conference of Asia and Australia (VASSCAA)

Included Journals:SCIE、EI、CPCI-S

Volume:86

Issue:7,SI

Page Number:881-884

ISSN No.:0042-207X

Key Words:Dual-frequency; Capacitively coupled plasma; Complete floating double probe

Abstract:A complete floating double probe technique is used to measure the ion density and electron temperature in a dual frequency capacitively coupled plasma for argon discharges. It has been shown that there is an obvious modulating effect of the high- and low-frequency powers on the plasma parameters and their spatial distributions. In addition, the influence of the discharge gap on the ion density and electron temperature is also investigated by varying the LF power and fixed the HF power. (C) 2011 Elsevier Ltd. All rights reserved.

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