Hits:

Indexed by:期刊论文

Date of Publication:2012-04-01

Journal:PLASMA SOURCES SCIENCE & TECHNOLOGY

Included Journals:SCIE、EI、Scopus

Volume:21

Issue:2

ISSN No.:0963-0252

Abstract:The electron behaviour in an Ar/CF4 inductively coupled plasma is investigated by a Langmuir probe and a hybrid model. The simulated and measured results include electron density, temperature and electron energy distribution function for different values of Ar/CF4 ratio, coil power and gas pressure. The hybrid plasma equipment model simulations show qualitative agreement with experiment. The effect of F-2 electron attachment on the electron behaviour is explored by comparing two sets of data based on different F atom boundary conditions. It is demonstrated that electron attachment at F-2 molecules is responsible for the depletion of low-energy electrons, causing a density decrease as well as a temperature increase when CF4 is added to an Ar plasma.