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Associate Professor Supervisor of Master's Candidates

Paper Publications

[61]Gu, B, Xu, Y, Qin, FW, Wang, SS, Sui, ZG, B (reprint author), Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Elect Bea, Dept Electromagnet Engn, Dalian 116024, Peoples R China..ECR plasma in growth of cubic GaN by low pressure MOCVD[J],PLASMA CHEMISTRY AND PLASMA PROCESSING,2002,22(1):159-174
[62]Xu, Y, Gu, B, Qin, FW, Y (reprint author), Dalian Univ Technol, State Key Lab Mat Modificat 3 Beams, Dalian 116024, Peoples R China..Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with...[J],JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2004,22(2):302-308
[63]王三胜, 顾彪, 徐茵, 秦福文, 隋郁, 杨大智.用N2-H2等离子体氮化GaAs衬底对ECR-PEMOCVD生长立方GaN的影响[J],发光学报,2001,22(z1):24-28
[64]王三胜, 顾彪, 徐茵, 徐久军, 秦福文, 杨大智.ECR-PEMOCVD法在GaAs(001)衬底上制备GaN量子点[J],半导体光电,2002,23(2):114-117
[65]徐茵, Wang Sansheng, 顾彪, 秦福文, 李晓娜, 王三胜, XU Yin, GU Biao, Qin Fuwen, Li Xiaona, Xu, Y..GaN在Si(001)上的ECR等离子体增强MOCVD直接生长研究[J],半导体学报,2002,23(12):1238-1244
[66]秦福文, 杨大智, 徐茵, 顾彪, Qin, FW (reprint author), Dalian Univ Technol, Natl Lab Mat Modificat 3 Beams, Dalian 116024, Peoples R China..氮化铝单晶薄膜的ECR-PEMOCVD低温生长研究[J],物理学报,2003,52(5):1240-1244
[67]秦福文, 顾彪, 徐茵, 杨大智.蓝宝石衬底的ECR等离子体清洗与氮化的RHEED研究[J],半导体学报,2003,24(6):668-672
[68]Liu, Bingbing, Huang, Lingqin, Zhu, Qiaozhi, Qin, Fuwen, Wang, Dejun, DJ (reprint author), Dalian Univ Technol, Fac Elect Informat & Elect Engn, Sch Elect Sci & Technol, Dalian 116024, Peoples R China..Chemical and electronic passivation of 4H-SiC surface by hydrogen-nitrogen mixed plasma (vol 10...[J],APPLIED PHYSICS LETTERS,2014,104(26)
[69]Gu, B, Xu, Y, Qin, FW, Wang, SS.Plasma pretreatment of GaAs substrates and ECR-PAMOCVD of cubic GaN[A],1998,524-527
[70]Qin, Fu-wen, He, Huan, Jiang, Xin, Xu, Yin, Gu, Biao, Wu, Ai-min.Growth and its properties of GaMnN film based on ECR-PEMOCVD[A],2007,561-565(PART 2):1193-1196

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