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个人信息Personal Information
教授
博士生导师
硕士生导师
性别：女
毕业院校：大连理工大学
学位：博士
所在单位：物理学院
电子邮箱：daizhl@dlut.edu.cn
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- [21]戴忠玲, 王友年.Atomic Layer Etching of Silicon and Silicon Dioxide Under Pulsed RF Substrate Bias[A],2014,1(1):33-33
- [22]Zhang, Sai-Qian, Dai, Zhong-Ling, Song, Yuan-Hong, Wang, You-Nian, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Effect of reactant transport on the trench profile evolution for silicon etching in chlorine pl...[J],VACUUM,2014,99:180-188
- [23]Bi, Zhen-Hua, Dai, Zhong-Ling, Zhang, Yu-Ru, Liu, Dong-Ping, Wang, You-Nian, ZH (reprint author), Dalian Nationalities Univ, Sch Phys & Mat Engn, Dalian 116600, Peoples R China..Effects of reactor geometry and frequency coupling on dual-frequency capacitively coupled plasm...[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2013,22(5)
- [24]张赛谦, 戴忠玲, 宋远红, 王友年.双频容性耦合Ar/CF4等离子体中双频源参数对刻蚀微观不均匀性影响的研究[A],2013,252-252
- [25]张赛谦, 戴忠玲, 宋远红, 王友年.双频容性耦合Ar/CF_4等离子体中双频源参数对刻蚀微观不均匀性影响的研究[A],2013,1
- [26]Dai, Zhong-Ling, Zhang, Sai-Qian, Wang, You-Nian, SQ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, 2 Linggong Rd, Dalian 116024, Liaoning, Peoples R China..Study on feature profile evolution for chlorine etching of silicon in an RF biased sheath[J],17th International Conference on Surface Modification of Materials by Ion Beams (SMMIB),2013,89(,SI):197-202
- [27]Zhang Saiqian, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Ion Transport to a Photoresist Trench in a Radio Frequency Sheath[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(11):958-964
- [28]Dai Zhongling, Yue Guang, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Fr...[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(3):240-244
- [29]Zhao Zhanqiang, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Feature Profile Evolution During Etching of SiO2 in Radio-Frequency or Direct-Current Plasmas[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(1):64-70
- [30]Zhang Hong, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Characteristics of a Collisional Sheath Biased by a Dual Frequency Source[J],PLASMA SCIENCE & TECHNOLOGY,2011,13(5):513-518
- [31]Dai, Zhong-Ling, Yue, Guang, Wang, You-Nian, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Study on mechanism of etching in low pressure radio-frequency plasmas[J],Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials (SPSM 2010),2011,11(5):S121-S125
- [32]赵占强, 戴忠玲, 王友年.射频等离子体刻蚀SiO2的数值研究[A],2011,163-163
- [33]赵占强, 王友年, 戴忠玲.射频等离子体刻蚀SiO_2的数值研究[A],2011,1
- [34]Dai Zhong-Ling, Wang You-Nian, Wang, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Nonlinear Plasma Dynamics in Electron Heating of Asymmetric Capacitive Discharges with a Fluid ...[J],CHINESE PHYSICS LETTERS,2011,28(7)
- [35]Dai Zhongling, Hao Meilan, Wang Younian, Wang, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Study of Characteristics of the Radio-Frequency Sheath over a Substrate with a Circular Trench[J],PLASMA SCIENCE & TECHNOLOGY,2011,13(1):50-54
- [36]戴忠玲, 王友年.Study on Feature Profile Evolution for Chlorine Etching of Silicon in a RF Biased Sheath[A],2011
- [37]戴忠玲, 王友年.Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequen...[A],2011
- [38]戴忠玲, 王友年.Study on Nonlinear Plasma Dynamics in Electron Heating of Asymmetric Capacitive Discharges with a...[J],CHIN.PHYS.LETT,2011,28(10):75202-75202
- [39]戴忠玲, 王友年.Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequen...[A],2010,648-648
- [40]戴忠玲, 王友年.Study on Nonlinear Resonance of Electron Heating in Asymmetric Capacitive Discharges with a Time-...[A],2010,55(7)