|
个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 大连理工大学常州研究院院长（2012-2016）
性别：男
毕业院校：大连理工大学
学位：博士
所在单位：材料科学与工程学院
学科：材料物理与化学. 材料表面工程. 等离子体物理
办公地点：三束材料改性教育部重点实验室2号楼（老三束北楼）301室
联系方式：Tel:0411-84708380-8301 Emil:gqlin@dlut.edu.cn
电子邮箱：gqlin@dlut.edu.cn
扫描关注
- [21]魏科科, 林菁菁, 张林, 韩克昌, 林国强.Cu含量对脉冲偏压电弧离子镀TiN-Cu纳米复合薄膜硬度的影响[J],真空,2013,50(3):52-56
- [22]Wang Yi-Nan, Liu Yue, Lin Guo-Qiang, Liu, Y (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Electron & Ion Beams, Dalian 116024, Peoples R China..A Computational Study of Radio Frequency Atmospheric Pressure Discharge in Nitrogen and Oxygen ...[J],CHINESE PHYSICS LETTERS,2013,30(3)
- [23]Ma, Guojia, Lin, Guoqiang, Gong, Shuili, Liu, Xing, Sun, Gang, Wu, Hongchen, GJ (reprint author), Beijing Aeronaut Mfg Technol Res Inst, Natl Key Lab Sci & Technol Power Beam Proc, POB 863, Beijing 100024, Peoples R China..Mechanical and corrosive characteristics of Ta/TaN multilayer coatings[J],17th International Conference on Surface Modification of Materials by Ion Beams (SMMIB),2013,89(,SI):244-248
- [24]林国强.Influence of the Cu content on the structure and properties of Zr-Cu-N films deposited by PBAIP[J],Rare Metal Materials and Engineering,2013,42(S2):86-89
- [25]林国强.The wettability Study of Different Films Prepared by Magnetron Sputtering Hybrid Deposition on th...[J],Rare Metal Materials and Engineering,2013,42(S2):0-0
- [26]Wang, Yinan, Liu, Yue, Zheng, Shu, Lin, Guoqiang, YA (reprint author), Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Effect of RF on RF nitrogen discharge with induced argon plasma at high pressure[J],JOURNAL OF PLASMA PHYSICS,2012,78(6):673-676
- [27]胡霖, 胡建军, 林国强, 张林, 孙刚, 马国佳.TC4钛合金表面电弧离子镀TiN/CrN纳米多层薄膜研究[J],真空科学与技术学报,2012,32(10):872-877
- [28]张林, 林国强, 马国佳, 魏科科.铜含量对脉冲偏压电弧离子镀Zr-Cu-N薄膜结构与性能的影响[A],2012,87-90
- [29]张林, 林国强, 马国佳, 魏科科, 段仲伟.脉冲偏压电弧离子镀Zr-Me-N(Me=Cr,Al,Cu)薄膜性能研究[A],2012,83-86
- [30]马国佳, 林国强, 王明娥, 张林, 孙刚, 王达望.磁控溅射复合沉积在Ti合金上的不同薄膜润湿性能研究[A],2012,170-173
- [31]马国佳, 巩水利, 张林, 林国强, 王明娥, 孙刚.表面形貌对薄膜疏水性能研究[A],2012,121-121
- [32]Wang, Yi-Nan, Liu, Yue, Zheng, Shu, Lin, Guo-Qiang, Y (reprint author), Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Numerical study on the characteristics of nitrogen discharge at high pressure with induced plas...[J],CHINESE PHYSICS B,2012,21(7)
- [33]Ma, Guojia, Lin, Guoqiang, Zhang, Lin, Sun, Gang, Gong, Shuili, GJ (reprint author), POB 863, Beijing 100024, Peoples R China..A study of structure and properties of Ti-doped DLC film by reactive magnetron sputtering with ...[J],APPLIED SURFACE SCIENCE,2012,258(7):3045-3050
- [34]林国强.Mechanical and corrosive characteristics of Ta/TaN multilayer coatings[J],Vacuum,2012,89(12):244-248
- [35]林国强.A study of enhancing hydrophobic property of the Ti alloy by PBII&D[J],Surface & Coatings Technology,2012,8(6):1232-1235
- [36]林国强.钛掺杂无氢类金刚石薄膜疏水性能研究[J],稀有金属材料与工程,2012,98(12):405-410
- [37]Zhao, Yanhui, Sun, Chao, Gong, Jun, Dong, Chuang, Lang, Wenchang, Xiao, Jinquan, Lin, Guoqiang, YH (reprint author), Chinese Acad Sci, Inst Met Res, 72 Wenhua Rd, Shenyang 110016, Peoples R China..Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating[J],APPLIED SURFACE SCIENCE,2011,257(13):5694-5697
- [38]Zhang, Min, Wu, Bo, Lin, Guoqiang, Shao, Zhigang, Hou, Ming, Yi, Baolian, M (reprint author), Liaoning Normal Univ, Sch Phys & Elect Technol, 850 Huanghe Rd, Dalian 116029, Peoples R China..Arc ion plated Cr/CrN/Cr multilayers on 316L stainless steel as bipolar plates for polymer elec...[J],JOURNAL OF POWER SOURCES,2011,196(6):3249-3254
- [39]刘琪, 林国强, 王文涛, Lin, G.(gqlin@dlut.edu.cn).磁场对电弧离子镀深管内壁沉积TiN薄膜的影响[J],真空科学与技术学报,2011,31(1):71-75
- [40]Zhao, Yanhui, Lin, Guoqiang, Xiao, Jinquan, Du, Hao, Dong, Chuang, Gao, Lijun, YH (reprint author), Chinese Acad Sci, Specialized Mat & Devices Div, Dept Surface Engn, Inst Met Res, 72 Wenhua Rd, Shenyang 110016, Peoples R China..Ti/TiN multilayer thin films deposited by pulse biased arc ion plating[J],APPLIED SURFACE SCIENCE,2011,257(7):2683-2688